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Succession Planning

Succession Planning: It’s Not Just for Your Executive Team

This article emphasizes the importance of identifying talent within an organization at any level and determining a clear path for developing their future. A sidebar covers succession planning tools, career profiling tools, teambuilding tools, candidate search tools and talent management plans. The author asserts that the whole company benefits by finding talent at any level and fostering its potential.

Learning Circuits v6 n3 March 2005

 

Senior Success-ion

Intelligence. While companies are often left in the lurch when a leader or senior manager leaves, not many -only 40 percent- are creating leadership pipelines to to address this issue. This article suggests creating an integrated leadership and executive development system to address this gap.

T+D v59 n1 p10-12 January 2005

 

Power Management for Talent Retention

Solutions. This article explains how Brown & Williamson Tobacco Company partnered with Kanexa to provide an enterprise-wide employee performance program that improved its corporate infrastructure and processes, talent retention, and succession planning.

T+D v58 n7 p68-69 July 2004

 

Succession Planning: Take Two

This Infoline presents a four-phase model for introducing an organization-wide succession plan. The four phases are defined as: establish the scope, create the plan, implement the plan, and monitor, evaluate, and revise. A key ingredient to the success of any succession plan is frequent and clear communication about the plan and what it means to employees and the organization. The job aid is workforce planning questionnaire.

Infoline 16p May 2004

 

14 Leadership Traps

This article identifies 14 common pitfalls of succession management systems. The author outlines reasons why it is better to promote from within the company. The sidebar discusses acceleration centers and how they help define specific, individual development needs and help organizations estimate how far and fast a candidate will progress.

T+D v56 n3 p56-63 March 2002